XEI SCIENTIFIC, INC.

 

1755 E. Bayshore Road, Suite 17, Redwood City, CA 94063
650/369-0133  Fax 650/363-1659
E-mail: information@Evactron.com  

Ronald Vane, President 
Gabe Morgan, PhD, Manager Application Laboratory & Product Manager
Tom Levesque, Director of Sales

Web Site: www.Evactron.com


 


Company Profile

XEI Scientific, Inc. makes the Evactron RF Plasma Cleaners (De-Contaminators) and Low Power RF Generators. The Evactron De-Contaminator is the world leader in RF Plasma ashing for carbon contamination removal in electron microscopes and other vacuum chambers. The Evactron D-C uses a unique RF plasma source to make Oxygen radicals from air for downstream plasma ashing of the hydrocarbons and carbon deposits found in vacuum chambers. Clean chambers up to 300 liters quickly. Safe and compliant to CE, RoHS, c NRTL us, and SEMI –S2.  Five year limited warranty for free factory repairs done overnight.
  

Product Lines


Products, Services and Markets

Hydrocarbon free vacuum enables many new technologies and improves the performance of others. The Evactron De-Contaminator was originally developed to clean electron microscopes for better images in 1999. Over 800 systems have been sold for this application alone. Today there are new vacuum processes that need carbon free vacuum such as EUV lithography, electron spectroscopy, and surface analysis. 

The Evactron D-C oxidizes carbon compounds with oxygen radicals made from air in a remote RF plasma Oxygen radical Source (ORS). The oxygen radicals and the oxidation products flow from the ORS though the vacuum chamber towards the pump.  The removal of carbon from the vacuum prevents the deposition of carbon in areas scanned by electron and ion beams or lasers and UV light.

The Evactron D-C ORS comes with a KF -40 flange and adaptor flanges are available to mate with other chamber ports. ORS  is small in size and easily held in one hand for mounting.