Web Site http://www.evactron.com
Company Profile
XEI Scientific was founded in 1991 by Ronald Vane to offer cleaning and decontamination solutions for electron microscopes. Early developments led to the need for more aggressive cleaning than the standard decontamination methods of nitrogen gas purging and cold trapping. Research and development led Mr. Vane to a downstream cleaning process with oxygen radicals. In 1998 Mr. Vane invented a patented process using downstream RF plasma cleaning. The tool, called the Evactron® De-Contaminator uses RF plasma to produce oxygen radicals from air to ash hydrocarbon contaminants in electron microscopes and other small instrument vacuum chambers. Mr. Vane holds three patents on the Evactron Technology with other patents pending. Growing Evactron global sales led by Vincent Carlino required that XEI Scientific expand its manufacturing and R&D space. XEI Scientific was incorporated in 2005 and moved into a new facility in Redwood City, CA in November of that year.Product Lines
Products, Services and Markets
The Evactron De-Contaminator quickly removes or immobilizes hydrocarbons in vacuum chambers by oxidation. The Evactron ORS (Oxygen Radical Source) is mounted to a chamber port with an adaptor flange to a KF40 fitting. The Evactron De-Contaminator uses air and RF power at a safe 10-20 watts to make the oxygen radicals, which flow by conduction through the chamber to the roughing pump. In lightly contaminated chambers, hydrocarbon concentrations can be reduced significantly in as little as 10 minutes of Evactron operation. Evactron cleaning is the quick and safe method to remove hydrocarbon contamination in vacuum chambers. In electron microscopes, Evactron cleaning removes the causes of black contamination scan-squares, improves resolution and contrast, and makes nanoprobing possible.
The Evactron De-Contaminator, in conjunction with a RGA, is a tool for diagnosing problems in new vacuum systems. If hydrocarbon peaks in the RGA spectra are not reduced, real leaks cannot be investigated. By using Evactron cleaning, hydrocarbons are removed from the chamber, and their peaks disappear from RGA spectra. The reappearance of hydrocarbons peaks within an hour indicates virtual leaks of hydrocarbons or hidden sources of hydrocarbons.
The Evactron process does not clean by sputtering or reactive ion etch, but it uses a gentle and safe oxidative etch. Using air as the oxygen source is recommended, although other gas mixtures can be used for more aggressive and faster cleaning. Air eliminates any damage to surfaces, specimens, vacuum systems, and dedicated instrumentation in the analytical instruments.
Other Sales Offices and Distributors
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NORTH AMERICA
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USA – Global Headquarters Vincent Carlino, Global Sales Director XEI Scientific, Inc. sales@evactron.com |
USA-Northeast and Mid Atlantic |
USA- Pacific Northwest Brian Miller |
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SOUTH AMERICA
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BRAZIL FUNDACAO DE AMPARO A PESQUISA |
BRAZIL Altmann s.a. |
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EUROPE
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AUSTRALIA Microanalysis Consulting |
Deutschland (Germany) Sales and Authorized Service |
France |
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ITALY (contract in progress) |
SPAIN – IZASA, S.A.
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UNITED KINGDOM SEM FIB Solutions |
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MIDDLE EAST
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MIDDLE EAST – ISRAEL Avi Farber, Sr VP Sales & Technology |
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ASIA
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JAPAN – Technolab |
KOREA – NAMOTEC (J. D. NAM) |
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SINGAPORE – Quasi-S PTE LTD
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TAIWAN PREMTEK INTERNATIONAL INC |
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